AMO Scientific JGS2 Fused Silica Wafer and Substrate, 1", 2" & 4" DSP

AMO Scientific JGS2 Fused Silica Wafer and Substrate, 1", 2" & 4" DSP

1" Dia. x 0.5mm/DSP/No flat
$18.95
$18.95
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AMO Scientific JGS2 Fused Silica Wafer and Substrate, 1", 2" & 4" DSP
  • AMO Scientific JGS2 Fused Silica Wafer and Substrate, 1", 2" & 4" DSP
  • AMO Scientific JGS2 Fused Silica Wafer and Substrate, 1", 2" & 4" DSP
  • AMO Scientific JGS2 Fused Silica Wafer and Substrate, 1", 2" & 4" DSP
  • AMO Scientific JGS2 Fused Silica Wafer and Substrate, 1", 2" & 4" DSP
AMO Scientific JGS2 Fused Silica Wafer and Substrate, 1", 2" & 4" DSP

AMO Scientific JGS2 Fused Silica Wafer and Substrate, 1", 2" & 4" DSP

$18.95
$18.95
Size/Polishing/Flat

AMO Scientific JGS2 Fused Silica Wafer and Substrate

AMO Scientific JGS2 fused silica wafers and substrates are high-purity SiO₂ optical substrates designed for semiconductor, photonics, MEMS, thin-film deposition and optical applications. Standard double-side polished (DSP) sizes include 1 inch, 2 inch and 4 inch / 100 mm wafers, as well as 10 × 10 mm substrates. Custom fused silica wafer dimensions, thicknesses and grades are also available.

JGS2 Glass is a high-purity synthetic quartz glass widely used in optics, semiconductors, and photonics. JGS2 has excellent transmission in the visible and near-infrared regions, but lower deep-UV transmission than JGS1.

Grade Spectral Transmission Range Typical Applications
JGS1 UV–Visible–IR (185–2500 nm) Precision optics, lithography
JGS2 UV–Visible (220–2500 nm) Optical windows, semiconductor processing
JGS3 Visible–IR (260–3500 nm) Infrared optics

 

Standard Product Specifications

 SKU Size Polishing Flat
AMO-JGS2-0001 1" Dia. x 0.5mm DSP N/A
AMO-JGS2-0002 2" Dia. x 0.5mm DSP 16mm
AMO-JGS2-0003 4" Dia. x 0.5mm DSP 32.5mm
AMO-JGS2-0004 10x10x0.5mm DSP N/A

AMO Scientific offers customized fused silica wafers, such as JGS1, JGS2, JGS3 and 7980. If you don't find the standard products work for your need, please feel free to reach us. 

Typical Properties of JGS2 Fused Silica

Property Value
Material Synthetic Fused Silica (SiO₂)
Density ~2.20 g/cm³
Refractive Index (589 nm) ~1.458
Softening Point ~1665°C
Thermal Expansion 5.5 × 10⁻⁷ /°C
Purity >99.99% SiO₂
Thermal Shock Resistance Excellent

Typical Applications


Semiconductor Industry

  • Photomask substrates
  • Wafer carriers
  • Process windows
  • Vacuum viewports

Optics & Photonics

  • Optical windows
  • Laser optics
  • Beam splitters
  • Optical filters

Research

  • MEMS devices
  • Microfluidics
  • Thin-film deposition substrates

JGS2 vs Silicon Wafer

Property JGS2 Fused Silica Silicon
Electrical Conductivity Insulator Semiconductor
Transparency Transparent Opaque
Bandgap N/A 1.12 eV
Thermal Expansion Very Low Higher
Optical Applications Excellent Poor

JGS2 vs Sapphire Wafer

Property JGS2 Sapphire
Hardness 5.5–6 Mohs 9 Mohs
Optical Transmission Excellent UV-Visible-NIR Excellent UV-IR
Thermal Conductivity ~1.4 W/m·K ~35 W/m·K
Cost Lower Higher
Machinability Easier More Difficult

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