AMO Scientific Lithium Niobate Thin Film on Insulator (LNOI) Wafers

AMO Scientific Lithium Niobate Thin Film on Insulator (LNOI) Wafers

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AMO Scientific Lithium Niobate Thin Film on Insulator (LNOI) Wafers

AMO Scientific Lithium Niobate Thin Film on Insulator (LNOI) Wafers

$0.00
Sale price  $0.00 Regular price 

AMO Scientific Lithium Niobate Thin Film on Insulator (LNOI) Wafers

Lithium Niobate Thin Film on Insulator wafers (LNOI) are engineered wafers made by placing a very thin single-crystal lithium niobate (LiNbO₃, LN) layer on top of an insulating layer, usually silicon dioxide (SiO₂), supported by a thicker substrate.

A typical structure is:

Why LNOI is important

Bulk lithium niobate has been widely used in optics because it has strong electro-optic, nonlinear optical, piezoelectric, and acousto-optic properties. The thin-film-on-insulator structure adds strong optical confinement, allowing very small photonic devices to be fabricated.

This makes LNOI useful for devices such as:

  • Optical modulators — especially high-speed electro-optic modulators
  • Photonic integrated circuits (PICs)
  • Optical waveguides
  • Microring resonators
  • Frequency converters
  • Second-harmonic generation
  • Quantum photonics
  • SAW / acoustic devices
  • Microwave photonics

AMO Scientific can customize the LiNbO3 orientation/thin film thickness, SiO2 layer thickness and substrate material. Please contact us to discuss your need.

 Sample Wafer Specifications:

General Wafer
Structure LiNbO3/ Oxide / Si
Diameter Φ100 ± 0.2 mm
Thickness 525 ± 25 μm
Primary Flat Length 32.5 ± 2 mm
Wafer Beveling R Type
TTV < 10 μm
LTV < 1.5 μm (5∗5 mm2) / 95%
Bow ± 50 μm
Warp < 50 μm
Edge Trimming 2 ± 0.5 mm
Lithium Niobate Layer
Average Thickness

300~900nm (customizable)

Orientation X axis ± 0.5°
Primary Flat Orientation Z axis ± 1°
Front Surface Roughness (Ra) < 1 nm
Bond Defects > 1 mm None ; ≦ 1 mm within 80 total
Front Surface Scratch

> 1 cm None ; ≦ 1 cm within 3 total

Oxide Layer
Thickness 4700 ± 150 nm
Uniformity ± 5%
Substrate
Material Si
Orientation <100> ± 1°
Primary Flat Orientation <110> ± 1°
Resistivity > 10 kΩ·cm
Backside Etched

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